Trusted Mask Trust Approach
Abstract
This project staffs and supports operation of a new secure (SECRET-level) photomask manufacturing capability at an existing state-of-the-art (SOTA) commercial photomask manufacturing supplier to secure masks and design intellectual property (IP) of acquisition programs during photomask data preparation, parsing and manufacturing. This capability can be used in conjunction with both Trusted and untrusted foundries. This capability will mitigate a supply chain gap for trusted masks at technology node sizes between 130 nanometers (nm) and 12/14nm.
Document Details
- Document Type
- Project
- Publication Date
- Oct 01, 2022
- Source ID
- 812_0605294D8Z_5_0400_PB_2022
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