Method and Means for Passivation and Isolation in Semiconductor Devices.

Abstract

In the patent application, the use of ion implantation to offset the effects of doping in semiconductors provides discreet regions of semi-insulated material and reduces the effects of strong bursts of transient radiation.

Document Details

Document Type
Technical Report
Publication Date
Jul 25, 1972
Accession Number
AD0164616

Entities

People

  • D. Eirug Davies

Organizations

  • United States Department of the Air Force

Tags

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Electronics
  • Implantation
  • Ion Implantation
  • Ions
  • Materials
  • Patent Applications
  • Patents
  • Radiation
  • Semiconductor Devices
  • Semiconductors
  • Solid State Electronics

Readers

  • Control Systems Engineering.
  • Nuclear and Radiation Engineering.
  • Semiconductor Device Technology

Technology Areas

  • Microelectronics