STUDY OF THE MAGNETIZATION OF THIN, EVAPORATED NICKEL FILMS IN A CHANGING ENVIRONMENT

Abstract

The magnetization of Ni films in the thickness range from a few to several hundred angstroms was investigated first under ultrahigh vacuum conditions and then after exposure to an O or H atmosphere at various pressures. Oxidation of the films to a depth of 10 to 15 angstroms takes place in a short time even at pressures of oxygen in the 10 to the -8th power mm range. Exposure to H of initially clean films resulted only in reversible changes of the transverseANISOTROPY CONSTANT. Unusually large increases in the transverse anisotropy of Ni films result when one changes a Ni-vacuum interface to a Ni-Cu interface. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 01, 1961
Accession Number
AD0258376

Entities

People

  • C.a. Neugebauer

Organizations

  • General Electric

Tags

DTIC Thesaurus Topics

  • Anisotropy
  • Atmospheres
  • Biological Phenomena
  • Climate Change
  • Ecological And Environmental Phenomena
  • Environment
  • Magnetization
  • Oxidation
  • Physical Properties
  • Reversible
  • Thickness
  • Transverse
  • Ultrahigh Vacuum
  • Vacuum

Fields of Study

  • Physics

Readers

  • Combustion science or combustion engineering.
  • Materials Science and Engineering.
  • Surface Engineering/Surface Coating Technology.