INDUSTRIAL PREPAREDNESS MEASURE ON SILICON HIGH FREQUENCY POWER TRANSISTOR
Abstract
Work done on both the base and emitter diffusions resulted in an over-all yield from diffusions of 45%. This yield is judged from transistors which meet the leakage specifications at 60 volts and at 150 volts These transistors are measured while they are on the silicon slice and have no contacts on them. The yield from transistors which go through the normal fabrication process is considerably lower due to subsequent operations. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1961
- Accession Number
- AD0264814
Entities
People
- David O'brien