PRODUCTION ENGINEERING MEASURE ON SILICON HIGH FREQUENCY POWER TRANSISTOR
Abstract
The failure to introduce back-diffusion into the process with a good yield led to a major change in the process. Work was carried out on the pull-back method of creating a N N junction in silicon which is described. Transistors made from this process have been successful in meeting the Vce sat in general. However as in the back-diffused units other parameters, especially Ico, have suffered. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1961
- Accession Number
- AD0272897
Entities
People
- David O'brien