CHEMICAL VAPOR DEPOSITION
Abstract
Papers on chemical vapor deposition including possibilities and problems of chemical vapor deposition, growth of crystalline films, whisker growth, vapor deposition of diffusion coating, vapor-phase transfer processes. Contents: The Promise and Problems of Chemical Vapor Deposition; High-Purity Metal Production; Coating of Particles; Molecular Electronics; Refractory Metal Coatings; Corrosion-Resistant Coating; Pyrolytic C; Refractory Carbon; Growth of Crystalline Films and Layers by Chemical Vapor Deposition; Bulk Deposits; Thin-Films and Epitaxial Growth; Whisker Growth; Metal-Organic Decomposition; Mechanisms For Metal Alkyl Decomposition; Stable Organic Molecule; Decomposition of Tetraphenylsilane; Decomposition of Tetracyclohexylsilane; Chemical Vapor Deposition of Diffusion Coatings; Vapor- Phase-Transfer Processes During Vapor Deposition; Surface Deposition - Gas Kinetics Controlling; Surface Deposition - Gas Diffusion Controlling; Problems Requiring Additional Research.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 04, 1962
- Accession Number
- AD0281887
Entities
Organizations
- Battelle Memorial Institute