TRIMETALLIC FILM PREPARATION BY ELECTROPHORETIC DEPOSITION.
Abstract
The feasibility was demonstrated of preparing thin (6000 - 10000A), low coercive force, 4-79 Mo permalloy films on Mo on-quartz substrates by electrophoretic deposition. The trimetallic films prepared were uniform in composition and thickness, and had low drive field requirements. However, they did not exhibit the square loop behavior required for use as switching devices. The lack of uniaxial anisotropy may be due to surface imperfections, impurities, localized stress, or improper magnetic alloying and annealing. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1962
- Accession Number
- AD0282059
Entities
People
- Martin H. Ortner
- Stanley J. Klach