DEVELOPMENT OF SILICON POWER TRANSISTORS.

Abstract

The NPIN structure was selected for the final fabrication of silicon power transistors. A discussion of the desired electrical parameters and their relationship to the physical structure of the device provides some of the necessary design criteria. Interdigitated or comb-type structures were evaluated to determine the optimum configuration for the current requirements. Photographs of the device are included to emphasize the product, as it is processed through each fabrication operation. Secondary breakdown of the device is discussed. Power dissipation measurements of final devices are included to show the device parameters obtained under normal circuit operation. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1962
Accession Number
AD0282112

Entities

People

  • A. L. Leotti
  • J. O'brien

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Design Criteria
  • Dissipation
  • Fabrication
  • Measurement
  • Photographic Materials
  • Photographs
  • Photography
  • Transistors

Fields of Study

  • Materials science

Readers

  • Microwave Engineering.
  • Semiconductor Device Technology
  • Structural Health Monitoring of Composite Structures.