THIN FILMS FORMED BY ELECTROCHEMICAL REACTIONS

Abstract

The preparation of several hundred thin-film Ta capacitors confirmed previous findings that the type of glass and the cleaning procedure used were necessary for obtaining high-quality capacitors. With the preparation of a large number of capacitors, data have been obtained on the uniformity of capacitance values. Improvements in both uniformity and electrical characteristics resulted from a reduction of the substrate temperature during tantalum sputtering, from the treatment of the sputtering mask and from spectroscopic monitoring for impurities in the glow discharge. The evaluation of electrical properties was extended to cover a range of frequencies and temperatures. The preparation of thin-film resistors by anodization of sputtered and vacuumevaporated Ta was accomplished. Resistance was reproducible to within 0.3% of the desired value. The films were evaluated for power dissipation, and the temperature coefficient of resistance was determined as a function of sheet resistivity and film thickness. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jun 30, 1962
Accession Number
AD0283053

Entities

People

  • E.r. Bowerman
  • J. Warren Culp
  • P.f. Hudock

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Capacitance
  • Capacitors
  • Coefficients
  • Electrical Impedance
  • Electrical Properties
  • Electrical Resistance
  • Electrochemical Reactions
  • Film Resistors
  • Films
  • Glow Discharges
  • Resistance
  • Resistors
  • Sputtering
  • Temperature Coefficients
  • Thin Film Resistors
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Electrical Engineering
  • Thin Film Deposition Science.