500 C SILICON CARBIDE RECTIFIER PROGRAM
Abstract
Silicon carbide crystals of the hexagonal type were grown in a Kroll-type furnace by the sublimation technique. Both homogeneous and grown junction crystals were prepared. To increase the yield and quality of the grown crystals, a new Kroll-type furnace was constructed and is being tested. The feasibility of vapor-phase chemical reaction methods was investigated for the controlled growth of silicon carbide platelets and sheets. The growth of junction crystals has emphasized the preparation of crystals with a high degree of perfection. The methods of rectifier fabrication are being studied. An improved metal ceramic header was tested and found to remain vacuum tight after operation at 500 C. The characteristics of two one-ampere rectifiers and a group of low current rectifiers are discussed. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 01, 1962
- Accession Number
- AD0283660
Entities
People
- H.c. Chang
- R.b. Campbell
Organizations
- Westinghouse Electric Corporation