SPUTTERING BY NORMALLY INCIDENT AND OBLIQUELY INCIDENT POSITIVE IONS
Abstract
This study involved the use of a low pressure plasma as a source of bombarding ions and a recently developed spectrometric method for measuring sputtering yield. The investigation was conducted to determine the effect of the incidence angle of the bombarding ions upon the threshold energy for sputtering with the particular ion-target combination used. Obliquely incident ions apparently contribute much more to the total sputtering yield, over all observed ranges of bombarding ion energies, than do normally incident ions. For the bombardment of gold with argon ions, thresholds of ion energy for obliquely incident ions and for normally incident ions were about 25 ev and 32 ev respectively. This study must be extended to more combinations of bombarding ions and sputtering targets before a definite contribution can be made. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- May 01, 1962
- Accession Number
- AD0284017
Entities
People
- Alan Rex Cole
Organizations
- Air Force Institute of Technology