DEVELOPMENT OF MICROELECTRONIC CIRCUITS FOR LINEAR APPLICATIONS

Abstract

Thin film capacitors with a large value of capacitance per unit area were fabricated from stacking a.c. anodized tantalum films. Several stacks containing four capacitors each had a capacitance equivalent to 4 microfarads/sq. in. and a dissipation factor of about 6%. The glow discharge method of depositing thin dielectric films was also studied. After solving the vapor pressure problem of the titanium feed material, it became possible to produce TiO2 deposits consistently. PbTiO3 deposition was also investigated to a limited extent. The main problem in the PbTiO3 film production is the stoichiometry of the deposited layer. The RC oscillator, tuned amplifier and audio amplifier were designed and fabricated using thin films and microelectronic components. (Author)

Document Details

Document Type
Technical Report
Publication Date
Oct 16, 1962
Accession Number
AD0287650

Entities

People

  • H.b. Martin

Organizations

  • Naval Air Warfare Center Warminster

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Amplifiers
  • Audio Amplifiers
  • Capacitance
  • Capacitors
  • Dielectric Films
  • Dissipation
  • Dissipation Factor
  • Films
  • Glow Discharges
  • Materials
  • Thin Film Capacitors
  • Thin Films
  • Tuned Amplifiers
  • Vapor Pressure

Readers

  • Electrical Engineering
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene