THE VAPORIZATION KINETICS OF SOLID SILVER

Abstract

The rates of free vaporization of single crystals of silver were measured as a function of the crystallographic orientation of the vaporizing surface, the mode of surface preparation, the degree of contamination, and the temperature. The flux from the (111), (110), (100) and polycrystalline surfaces was continuously measured, and the concurrent morphological state of the surface was noted. The flux was measured throughout the period of vaporization by monitoring the fundamental frequency shift of an AT cut quartz oscillator positioned so as to intercept a known fraction of the flux from the vaporizing surface. The results indicate that the vaporization kinetics of single and polycrystalline surfaces with the degree of perfection corresponding to as-grown or annealed single crystals are essentially ideal and independent of the crystallographic orientation of the surface. Cert in types of surface impurities are shown to markedly influence the kinetics of vaporization. (Author)

Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1962
Accession Number
AD0290722

Entities

People

  • J.p. Hirth
  • W.l. Winterbottom

Tags

DTIC Thesaurus Topics

  • Contamination
  • Crystals
  • Frequency
  • Frequency Shift
  • Impurities
  • Kinetics
  • Monitoring
  • Orientation (Direction)
  • Oscillators
  • Polycrystals
  • Single Crystals
  • Transition Temperature
  • Vaporization

Readers

  • Thin Film Deposition Science.