SPUTTERING YIELDS
Abstract
This report includes: SPUTTERING YIELDS FOR LOW ENERGY He+-, AND X3+ION BOMBARDMENT, by D. Rosenberg and G. K. Wehner. 2 Nov 61, (Reprint from Jnl. of Applied Physics 33:18421845, May 62) Sputtering yield measurements for various metals under noble gas ion bombardment in the energy range 50 to 600 ev were essentially completed. Results for metals, including some rare earths, under He(+)-, Ne(+)-, Ar(+)-, Kr(+)-, Xe(+)-, and Hg(+)- ion bombardment are presented in over 200 yield curves. The spectroscopic technique for measuring sputtering threshold energies is described in an enclosed reprint entitled 'Sputtering Yields at Very Low Ion Energies' published in the Journal of Applied Physics. This technique has now been applied to the measurement of the velocity distribution of sputtered atoms by pulsing a target and measuring the transit time of sputtered atoms to an observation point a known distance away from the target. Velocity distributions of atoms sputtered from polycrystalline and single crystal Cu targets are presented. Average velocities are in the range 3 to 10 ev, in good agreement with previous measurements and higher than atoms thermally evaporated. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 15, 1962
- Accession Number
- AD0291667
Entities
People
- D. Rosenberg
- G.k. Wehner
- R.v. Stuart