PRODUCTION DEVELOPMENT OF SILICON PLANAR EPITAXIAL TRANSISTOR WITH A MAXIMUM OPERATING FAILURE RATE OF 0.0010/0 PER 1000 HOURS AT A CONFIDENCE LEVEL OF 90( AT 25 C

Abstract

Effort is made to improve production techniques in order to increase the reliability of silicon planar epitaxial transistor type 2N696 with a maximum operating failure rate of 0.001% per 1000 hours at a 90% confidence level at 25 C. as an objective. The failure rate is an objective, and as a minimum all of the following processes are to be improved toward attaining or exceeding the specified failure rate: surface preparation, diffusion processing, epitaxial starting material, wire bonding, metallizing and geometry definition. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jul 31, 1962
Accession Number
AD0292071

Entities

People

  • Benjamin R. Davis
  • George V. Russell

Organizations

  • Motorola Mobility

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Diffusion
  • Geometry
  • Materials
  • Metallizing
  • Production
  • Reliability
  • Transistors

Readers

  • Electronics Engineering
  • Software Engineering
  • Thermal Physics or Thermal Science.