PRODUCTION RELIABILITY IMPROVEMENT PROGRAM FOR GERMANIUM TRANSISTOR 2N1430

Abstract

Effort was continued toward improving production techniques to improve the reliability of the 2N1430 germanium transistor using as an objective a maximum operating failure rate of 0.05% per 1000 hours at a 90% confidence level of <% C. Major areas considered were: (1) resistivity control, etch pit control, uniform penetration in diffusion depth control in alloying, spr ding and wetting in alloying, collector attachment, surface passivation, final preparation prior to sealing, gettering technique, and leak determination; ( <) information and data to demonstrate the results in the areas of study; and (3) quality control measures to insure accuracy and reliability of established process techniques.

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Document Details

Document Type
Technical Report
Publication Date
Oct 31, 1962
Accession Number
AD0295692

Entities

People

  • Dennis Fallon
  • Henry Sivik
  • John Szafranski

Tags

Communities of Interest

  • Advanced Electronics
  • Weapons Technologies

DTIC Thesaurus Topics

  • Chemistry
  • Contracts
  • Depth Control
  • Electronics
  • Elements
  • Engineering
  • Engineers
  • Germanium
  • Materials
  • Measurement
  • Molecular Sieves
  • Production
  • Production Engineering
  • Quality Control
  • Reliability
  • Semiconductors
  • Transistors

Readers

  • Semiconductor Device Technology
  • Software Engineering
  • Surface Engineering/Surface Coating Technology.