500 C SILICON CARBIDE RECTIFIER PROGRAM
Abstract
Hexagonal silicon carbide crystals are being grown in a Kroll-type furnace by the sublimation technique. In order to obtain greater control over the growth variables a new furnace has been assembled and is being used in a series of experiments. This furnace should give valuable information on crystal growth parameters. The research on grown junction crystals has emphasized the preparation of crystals with a high degree of surface and internal perfection by studying the effect of radiation sinks and cavity geometry. The methods and materials of device fabrication are being studied and adapted to meet stability and quantity processing requirements. Electrical characteristics at various temperatures are given for several encapsulated rectifiers. The electrical properties of these rectifiers had been stabilized by an ambient atmosphere treatment prior to encapsulation.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1963
- Accession Number
- AD0296942
Entities
People
- H.c. Chang
- R.b. Campbell
Organizations
- Westinghouse Electric Corporation