RESEARCH AND DEVELOPMENT FOR FIELD EFFECT TRIODES AND SPACE CHARGE LIMITED TRIODES.
Abstract
Field effect triodes: The possible conduction mechanisms for thin-film, field effect triodes are discussed. Experimental findings seem to rule out charge redistribution and substantiate the change in injection rate and trap emptying mechanism. The wire masking for source-drain gaps and CdS evaporation from a Drumheller source are described. Methods of depositing SiO to ob tain both good adherence and isolation are given. Both ac and dc measurement for field effect triodes are discussed and characteristics of these devices tabulated. Space charge limited triodes: A modification of the theory for space charge limited triodes and a set of experimental conditions to obtain SCL action are presented. These conditions pertain to the film resistivity and current density in the CdS layer. Difficul ties in obtaining high resistivity CdS films by various deposition methods are discussed and a simplified SCL triode configuration is described. Measurements of the diode characteristics of these triodes are presented. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 30, 1962
- Accession Number
- AD0402830
Entities
People
- J.m. Lank
- K.k. Einhartz
- W. Antraporn
- W.l. Illis
Organizations
- General Electric