GALLIUM PHOSPHIDE DEVICES

Abstract

Synthesis of gallium phosphide by an open flow technique, by passing P vapor over Ga2O3 in a H atmosphere was accomplished. Variations in color, and unreacted components were noted. Some involving varying temperatures, flow rates and time were carried out for the purpose of rationalizing product differences. Synthesis was best when P temperature and flow rate wereand when the Ga2O3 charge had minimum temperature gradients across it. Melt growth of the synthesized material was carried out. A total of 15 melts were made. Several were aborted due to malfunctions in furnacing. Several were partially successful, but produced heavily occluded ingots. Several were successful in that ingots were clear, with few if any inclusions and good crystal structure, although not single crystal. Vapor phase growth studies were done in parallel with melt growth. Initial results appear promising.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Apr 01, 1963
Accession Number
AD0404268

Entities

People

  • J. Budiselic
  • J. R. Musgave
  • L. E. Stone
  • Lemuel A. Brown
  • S. Roderique

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force
  • Crystal Growth
  • Crystal Lattices
  • Crystal Structure
  • Crystals
  • Decomposition
  • Dissociation
  • Electronics
  • Electronics Laboratories
  • Fabrication
  • Flow Rate
  • High Pressure
  • Materials
  • Melting Point
  • Optical Materials
  • Single Crystals
  • Temperature Gradients

Readers

  • Materials Science and Engineering.
  • Solar Photovoltaics and Thermoelectric Devices.
  • Thermal Physics or Thermal Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene