THIN FILM ACTIVE DEVICES

Abstract

The use of evaporated, rather than thermally grown, layers of Al2O3 has alleviated the shorting problem in the MEA tunnel emission device. High input impedance devices showing transconductance values as high as 25,000 micro mhos have been obtained in this way. A tentative equivalent circuit for the device is presented. Studies of the conduction processes in CdS-Al2O3-Al diodes continue. Thin films of CdS show resistivities of approximately 0.1 ohm-cm, mobilities of 10 cm squared/V-sec, and carrier concentrations of 7 x 10 to the 18th power/cm cubed.

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Document Details

Document Type
Technical Report
Publication Date
Dec 22, 1962
Accession Number
AD0408472

Entities

People

  • James P. Spratt

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aluminum Oxides
  • Compound Semiconductors
  • Electronics Laboratories
  • Equivalent Circuits
  • Films
  • Geometry
  • Impedance
  • Materials
  • Mean Free Path
  • Measurement
  • Metal Oxides
  • Oxide Films
  • Oxides
  • Semiconductor Devices
  • Semiconductors
  • Solid State Electronics
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Mathematics or Statistics
  • Semiconductor Device Technology
  • Thin Film Deposition Science.