TUNNEL CATHODES FOR MICROWAVE TUBES
Abstract
Efforts were continued on the development of thin-film tunnel cathodes for microwave tubes. Equipment modifications and improvements made are described in detail. Two vacuum deposition systems are now in operation. One system is designed specifically for CdS work, and the other system for other insulating barrier materials. Both systems have quartz crystal film-thickness monitors in operational use. In both systems, the complete three-layer cathode structure can be fabricated completely in vacuum. In the case of the CdS system, the cathodes have to be tested in another vacuum system at the present time. In the other system, however, the cathodes fabricated in vacuo can then be tested without exposure to atmosphere. The structures Au-SiO Au, Mo-SiO-Mo, and Mo-CdS-Mo were studied. The Mo-SiO-Mo structure is the most promising cathode so far tested. It shows potential for high efficiency and long life. The calculations of the relaxation frequency of hot electrons and holes in metals and semiconductors was completed. The calculations for hot holes in metals are presented. Numerical results were calculated and presented.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1963
- Accession Number
- AD0409278
Entities
People
- B. V. Dore
- D. V. Geppert
Organizations
- SRI International