COMPATIBLE TECHNIQUES FOR INTEHRATED CIRCUITRY

Abstract

The design and manufacturing flexibility to be attained through the combination of semiconductor and thin film technologies is presented. The utilization of a wide variety of materials to construct circuit elements provides wider range of component values to closer tolerances than can be achieved if only one technology and material is used. Furthermore, the component parasitic parameters such as temperature coefficients, voltage sensitivity and loss factors can be better controlled if more than one material is available to construct components. Of great importance is the electrical isolation of critical circuit elements which is achievable when thin film elements are combined with silicon elements. In summary, the principle advantages of a compatible thin film - single block silicon technology are listed.

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Document Details

Document Type
Technical Report
Publication Date
Jan 31, 1963
Accession Number
AD0414104

Entities

Organizations

  • Motorola Mobility

Tags

DTIC Thesaurus Topics

  • Air Force
  • Aluminum Oxides
  • Amplitude Modulation
  • Chemistry
  • Circuit Boards
  • Dielectrics
  • Fabrication
  • Field Effect Transistors
  • Life Tests
  • Materials
  • Materials Processing
  • Materials Science
  • Modulation
  • Semiconductors
  • Silica Glass
  • Silicon Dioxide
  • Test And Evaluation

Fields of Study

  • Engineering

Readers

  • Microwave Engineering.
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene