RESEARCH ON EXPERIMENTAL EVALUATION OF SPUTTERING YIELD RATES

Abstract

Phenomena associated with the interaction of high energy ions and solid surfaces under conditions relevant to ion rocket operation were investigated. The number of target atoms removed per incident ion, or sputtering ratio, has been determined for xenon and argon ions incident on copper, tungsten, molybdenum, silicon and titanium with energies from 1,500 to 39,000 electron volts and at incidence angles from 2 degrees to normal incidence. The effect of target temperatures, both high and low, on the sputtering ratio has been investigated. The ratio of secondary particles produced to incident ions, along with their energy and angular distribution, has been investigated as functions of ion energy and incidence angle. Areas investigated include: (1) sputtering and secondary emission for very low angles of ion incidence, and effects of surface roughness; (2) the energy and angular distributions of secondary particles as a function of beam incidence angle; and (3) sputtering and secondary emission of surfaces at reduced temperatures.

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Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1963
Accession Number
AD0415285

Entities

People

  • E. E. Rogers
  • E. T. Pitkin
  • K. B. Cheney

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force
  • Charged Particles
  • Crystal Lattices
  • Crystal Structure
  • Crystals
  • Detectors
  • Electron Emission
  • Electrons
  • Emission
  • Energy
  • Energy Transfer
  • High Energy
  • Low Angles
  • Materials
  • Measurement
  • Surface Properties
  • Surface Roughness

Fields of Study

  • Physics

Readers

  • Molecular Photonics/Laser Physics
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene