RESEARCH STUDY FOR INCREASING THE SENSITIVITY OF PHOTOEMITTERS
Abstract
Progress is reported in the development of ap paratus for simultaneous and quasi-simultaneous deposition of the constituents of S-20 photo cathodes by the mouccular beam technique. Several modifications of standard S-20 cathodes were attempted. A conducting substrate for the Cs-K-Sb photocathode has been developed. X-ray diffraction and chemical analysis experiments were conducted to establish the chemical com position of Cs-K-Sb cathodes. Development of the techniques for high energyellectron diffraction of photocathodes and low energy electron diffrac tion of single crystals has been continued. Small area shallow p-n junctions have been pre pared in germanium by diffusion and epitaxial growth for field induced phomeemission with low reverse bias currents. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 16, 1963
- Accession Number
- AD0416686
Entities
People
- A. H. Sommer
- C. R. Fuselier
- E. K. Gatchell
- R. E. Simon
- W. H. Mccarroll
Organizations
- Sarnoff Corporation