RESEARCH ON THIN FILM INSULATORS.
Abstract
The purpose of this study was to investigate the properties of and the conduction mechanism in very thin insulating films. The methods of preparation of thin insulating films of elec troless glow discharge and by base electrode glow discharge were developed and concentrated on production of films between 20-100 Angstroms thicn analysis of the merits and advan tages of these two methods was made and is pre sented here. A multiple beam interference meth od of measuring thickness of films below 100 Angstroms was developed. This method should be capable of measuring films below 10 Angstroms. Capacitance and I-V characteristic measurements were made on a variety of thin film materials. Both pulsed and d.c. methods were used to de termine the current voltage relationship. An analysis of these results in terms of Schottky emission and other thermal mechanisms was made, but no definite conclusions regarding the con duction mechanism are presented at this time. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 24, 1963
- Accession Number
- AD0417974
Entities
People
- A. E. Cahill
- J. M. Blank
- S. W. Ing
- V. A. Russell
- W. J. Van Der Grinten
Organizations
- General Electric