CURRENT-VOLTAGE RELATIONS FOR THIN FILM TUNNELING STRUCTURES,

Abstract

Current-voltage characteristicb have been calculated for a structure consisting of two metal surfaces separated by a thin film of insulating material. The analysis inclu4es both tunn5ling and thermionic emission, and takes account of dielectric constant and image force. Curves of current density versus field strength are presented for various values of barrier height and dielectric constant. Several comparisonk of thenry with experiment are given. (Author)

Document Details

Document Type
Technical Report
Publication Date
Sep 05, 1963
Accession Number
AD0418982

Entities

People

  • J. L. Kcales

Organizations

  • Harry Diamond Laboratories

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Current Density
  • Dielectric Permittivity
  • Emission
  • Films
  • Materials
  • Quantum Tunneling
  • Thermionic Emission
  • Thin Films
  • Tunneling

Fields of Study

  • Physics

Readers

  • Plasma Physics.
  • Superconducting Magnet Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene