ELECTRICAL IONIZATION PHENOMENON IN GOLD-DOPED SILICON,
Abstract
An electrical breakdown phenomenon in heavily gold-doped silicon has been observed. The samples prepared with the proper ohmic end contacts exhibit linear current-voltage relationships at low fields, followed by a slight saturation in current (only in some samples). Then at some critical electric field, a sharp increase in current density (more than one order of magnitude) occurs. Some of the samples also exhibit negative incremental resistance at high values of the current density. This phenomenon is readily seen at room temperature in n-type samples, and at dry-ice temperatures in p-type samples. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 01, 1963
- Accession Number
- AD0422697
Entities
People
- V. G. K. Reddi
Organizations
- Stanford University