500 C SILICON CARBIDE RECTIFIER PROGRAM.

Abstract

Efforts were continued on the development of methods for quality-quantity production of SiC rectifiers. A larger diameter sublimation furnace was designed and fabrication will begin shortly. With a larger growth cavity and therefore a greater surface area available for crystal growth, the number of usable crystals per run should increase. Epitaxial layers of containing a p-n junction were prepared and evaluation is in progress. The design of the equipment needed for quantity production of SiC rectifiers is nearly complete. (Author)

Document Details

Document Type
Technical Report
Publication Date
Dec 31, 1963
Accession Number
AD0427196

Entities

People

  • D. R. Thornburg
  • Hsing-Yin Chang
  • J. Ostroski
  • L. J. Kroko
  • V. J. Jennings

Organizations

  • Westinghouse Electric Corporation

Tags

DTIC Thesaurus Topics

  • Carbides
  • Compound Semiconductors
  • Crystal Growth
  • Crystals
  • Diameters
  • Electronic Equipment
  • Fabrication
  • Modules (Electronics)
  • P-N Junctions
  • Production
  • Rectifiers
  • Semiconductor Devices
  • Semiconductors
  • Silicon
  • Silicon Carbide
  • Sublimation

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Software Engineering