PRODUCTION ENGINEERING MEASURE ON SILICON ALLOY TRANSISTORS.

Abstract

Centering of the silicon resistivity specification is described with parameter distributions. Introduction of X-ray orientation, I. D. slicing and variably indexed scribing is discussed. A modified rinsing tank with electrolytic monitoring was introduced into production. The feasibility of the use of a thermographic phosphor to monitor burn-in racks was demonstrated as a reliable production technique. Power step-stress was used to monitor the improvement of production product. (Author)

Document Details

Document Type
Technical Report
Publication Date
Sep 30, 1963
Accession Number
AD0428089

Entities

People

  • A. W. Postlethwaite
  • L. F. Leary
  • R. W. Jones

Organizations

  • RTX

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Alloys
  • Engineering
  • Metalloids
  • Monitoring
  • Orientation (Direction)
  • Phosphors
  • Production
  • Production Engineering
  • Production Management Methods
  • Productivity
  • Silicon
  • Silicon Alloys
  • Specifications
  • Transistors
  • X Rays

Fields of Study

  • Materials science

Readers

  • Computational Modeling and Simulation
  • Structural Health Monitoring of Composite Structures.
  • Thin Film Deposition Science.