INVESTIGATION OF TRANSIENT RADIATION DAMAGE IN SEMICONDUCTOR MATERIALS.
Abstract
A high-frequency technique was developed for the measurement of bulk carrier lifetime in silicon samples. The use of contacts was eliminated. The technique is based on the measurement of the Q-value of a tank circuit which contains the sample. A single tube (6J6) is used to generate the oscillations and to measure transient changes of the Q-value. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 31, 1963
- Accession Number
- AD0433623
Entities
People
- Roland M. Lichtenstein
Organizations
- Rensselaer Polytechnic Institute