THE MECHANISM OF OXIDE FORMATION IN THE INITIAL STAGES OF OXIDATION.

Abstract

The purpose of this work was to investigate the reaction of gaseous oxygen with clean tungsten and tantalum substrates in the initial stages of oxidation in order to determine the role of chemical, physical, and structural factors--and hence the initial mechanism of oxidation. (Author)

Document Details

Document Type
Technical Report
Publication Date
Mar 06, 1964
Accession Number
AD0436569

Entities

People

  • D. W. Rausch
  • K. L. Moazed
  • M. G. Fontana

Organizations

  • Ohio State University

Tags

DTIC Thesaurus Topics

  • Chemical Compounds
  • Elements
  • Metals
  • Ores
  • Oxidation
  • Oxides
  • Oxygen Compounds
  • Refractory Metals
  • Rocks And Deposits
  • Substrates
  • Tantalum
  • Tungsten

Readers

  • Thin Film Deposition Science.