PRODUCTION ENGINEERING MEASURE. RELIABILITY THRU PROCESS IMPROVEMENT (2N1506).
Abstract
Efforts continued on the establishment of a PEM for the 2N1506 silicon triple diffused transistor. Evaluation of lead attachment and encapsulation techniques were completed. Linear life test results indicate a low failure rate for those improvements incorporated into the 2N1506 production process, and show a capability of providing the desired reliability level. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 31, 1963
- Accession Number
- AD0437914
Entities
People
- G. Kamienski
- I. Massaron
- P. Kellow
- Rachel N. Austin