APPLICATION OF IONIC BEAMS TO STUDY OF CORROSION OF METALS BY GASES

Abstract

Contents: Effects of atomic oxygen on semiconductor oxides; A self sustaining dipole discharge in oxygen; Corrosion of metal films in an oxygen plasma at high pressure; and Oxidation of aluminum films after ionic bombardment with helium or xenon.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 1964
Accession Number
AD0451245

Entities

People

  • Derek Klemperer
  • Jens Traetteberg
  • Nguyen T. Dzoanh
  • Sigemaro Nagakura
  • Walter J. Moore

Organizations

  • Indiana University Bloomington

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Charged Particles
  • Chemical Reaction Properties
  • Chemical Reactions
  • Contracts
  • Crystal Structure
  • Diffraction
  • Electrodes
  • High Pressure
  • Ionization
  • Ions
  • Magnetic Fields
  • Materials
  • Metal Films
  • Oxide Films
  • Particle Beams
  • Sodium Compounds
  • Space Charge

Fields of Study

  • Materials science
  • Physics

Readers

  • Electrical Engineering
  • Plasma Physics / Magnetohydrodynamics
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene