RELIABLE DIELECTRIC FILMS FOR MICROCIRCUITS

Abstract

Contents: Dielectric Breakdown at Conductor Edges--The Edge Effect; Properties and Performance of SiO Capacitors; Interrelation of Deposition Parameters (Rate and Dielectric Thickness) with Dielectric Properties; Leakage Resistance, Dissipation Factor, Temperature Coefficient of Capacitance (TCC); progress of Life Tests at 85 C and 125 C; 85 C Life Tests; 125 C Life Tests; Sputtered Dielectric Films; Silicon Nitride; Other Reactively Sputtered Dielectrics; Cross-Sectioning of Thin Films.

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Document Details

Document Type
Technical Report
Publication Date
Oct 26, 1964
Accession Number
AD0453220

Entities

People

  • Gilbert A. St. John
  • Saul W. Chaikin

Organizations

  • SRI International

Tags

DTIC Thesaurus Topics

  • Capacitors
  • Chemistry
  • Crystal Structure
  • Crystals
  • Dielectric Films
  • Dielectric Properties
  • Dielectrics
  • Electrical Properties
  • Electron Microscopes
  • Electronic Components
  • Electronics Laboratories
  • Materials Laboratories
  • Materials Processing
  • Materials Science
  • Piezoelectric Crystals
  • Plastic Explosives
  • Titanium

Readers

  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene