INVESTIGATION OF ULTRA HIGH VACUUM SPUTTERED THIN FILMS.
Abstract
Germanium films were sputtered onto quartz and self-substrates in a low-pressure thermionically supported discharge. Reflection electron diffraction and x-ray examination showed that over comparable temperature ranges the orientation of sputtered geranium on quartz films differed from that of evaporated films. Epitaxy was observed on self-substrates at 150 C. Electrical characteristics of evaporated and sputtered films were strikingly similar despite wide variation in substrate material and temperature and in deposition rates. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 30, 1964
- Accession Number
- AD0454939
Entities
People
- S. P. Wolsky