METAL-ORGANIC COMPOUNDS FOR VAPOR PLATING APPLICATION.

Abstract

This report covers progress in studies of the feasibility of vapor plating by depositing metals from selected metal-organics. The metals under study include Al, B, Nb, Hf, Mo, Si, Ta, Ti. Relatively pure deposits of Al and B were produced, as well as a pure codeposit of Al-Ta. The most promising results to date are single deposits of Mo and Ti and codeposits of Mo-Si and B-Ti. Use of NH3 as an additive in the H2 carrier gas stream significantly reduced the decomposition temperature of dicyclopentadienyl hafnium dichloride. Future plans are to continue studies on the deposition of single metals, on codeposition from single metal-organics and from two metal-organics simultaneously, and on the use of NH3 and other reducing gases as carrier gases. (Author)

Document Details

Document Type
Technical Report
Publication Date
Nov 01, 1965
Accession Number
AD0476821

Entities

People

  • E. B. Rifkin
  • J. Kozikowski
  • L. M. Niebylski
  • R. D. Stevenson
  • R. L. Mack

Tags

DTIC Thesaurus Topics

  • Additives (Chemicals)
  • Chemical Compounds
  • Chemical Reactions
  • Decomposition
  • Organic Compounds
  • Plating
  • Vapor Plating

Readers

  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.