CALCULATION OF SURFACE BINDING ENERGIES BY COMPUTER SIMULATION OF THE SPUTTERING PROCESS.

Abstract

Sputtering of monocrystalline copper, a face-centered cubic, was investigated by computer simulation techniques using the Born-Mayer potential. Normally incident argon ions were shot into the (111), (110), and (100) orientation at various energies. Qualitatively correct deposit patterns were obtained for all orientations. Surface irregularities were found to play a significant role in the sputtering mechanism. Approximate values for the surface binding energy on the (111) and (110) orientations were 2.25 eV and 3.0 eV, respectively. (Author)

Document Details

Document Type
Technical Report
Publication Date
May 01, 1966
Accession Number
AD0483674

Entities

People

  • John Palmer Johnson Iii.

Organizations

  • Naval Postgraduate School

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Computer Simulations
  • Computers
  • Control Simulators
  • Crystal Structure
  • Orientation (Direction)
  • Simulations
  • Simulators
  • Sputtering

Readers

  • Materials Science and Engineering.
  • Plasma Physics.
  • Thin Film Deposition Science.