PRODUCTION ENGINEERING MEASURE. ITEM 9 SILICON GROWN DIFFUSED TRANSISTOR TYPE 2N336.
Abstract
Presented are the improved passivation and encapsulation techniques as well as the evaluation of the effectiveness of these techniques, the reliability estimate as a function of stress and a multi-level high reliability specification which characterizes the device for high reliability applications. The expected failure rate, at the upper 90% confidence limit as extrapolated using least square techniques and the Arrhenius failure model, is shown to be 0.01% per 1000 hours operation at 235 mw at 25C ambient temperature. As a result of this work a multi-level high reliability device specification has been written about this production line. This specification and the qualification testing to it are included in this report. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 30, 1964
- Accession Number
- AD0601889
Entities
People
- P. W. Olski
Organizations
- General Electric