INTEGRATED SILICON DEVICE TECHNOLOGY. VOLUME III. PHOTOENGRAVING.

Abstract

Within the limits of available information, this report describes typical photoengraving techniques used in silicon integrated device technology. The various types of photoresists and photosensitive coatings are described along with their known properties. Step-by-step procedures are included for the use of these resists. A general evaluation of the photoengraving process and its limits is included. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 1964
Accession Number
AD0603715

Entities

People

  • J. J. Wortman

Organizations

  • RTI International

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Photoengraving
  • Test And Evaluation

Readers

  • Business Analytics
  • Nanofabrication and Microfabrication.