THICKNESS AND COMPOSITION OF VACUUM-DEPOSITED NICKEL-CHROMIUM FILMS,
Abstract
Thin films of nickel-chromium were deposited on planar glass substrates by vacuum evaporation of the alloy 'Nichrome V' with a nominal bulk composition: Ni 80% - Cr 20%. The nickel-chromium ratio of deposited films was determined by chemical microanalysis (using spectrophotometric methods), the thickness by optical interferometry. The interdependencies of thickness, composition ratio, sheet resistivity, temperature coefficient of resistance, film density, and other film parameters were investigated or derived and the interrelations of these variables are discussed. It is shown quantitatively how-under constant evaporation and deposition conditions-the nickel-chromium composition ratio varies with the sheet resistivity and how, on the other hand, the sheet resistivity varies with the thickness of these films. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 01, 1964
- Accession Number
- AD0605294
Entities
People
- Isaac H. Pratt
- William L. Wade
- William Weintraub
Organizations
- United States Army Communications-Electronics Command