LOW TEMPERATURE VAPOR GROWTH STUDIES.
Abstract
Topics include: room temperature polishing of Ge and GaAs using NaOCl solutions; high temperature etching of Ge with HI; growth rate in the Ge-I2-He-H2 vapor transport system; exitaxial Ge growth in the Ge-C12-H2 system; Bourdon gauge measurements on the GeCl2 system; photochemical etching of Ge and Si with Cl2; optical absorption in several open tube systems; transpiration in the Ga-HI-H2 and Ge-HI-H2 systems; growth of Si single crystals by the H2 reduction of SiCl4.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 30, 1964
- Accession Number
- AD0606797
Entities
People
- A. Reisman
Organizations
- IBM Thomas J. Watson Research Center