PREPARATION AND EVALUATION OF VACUUMDEPOSITED NICKEL-CHROMIUM THIN-FILM RESISTORS,

Abstract

Results of studies of some properties of thin film nickelchromium resistors are presented. Nichrome (80% Ni, 20% Cr) was vacuum evaporated and deposited through masks in 5, 10, 20 and 40 mil wide strips onto various planar substrates with different surface characteristics, (e.g., glass, mylar, micro-module alumina wafers). The following parameters and their interdependencies were measured and studied: sheet resistivity (ohms per square), film thickness, aging conditions (post deposition static heat treatment), substrate surface and material, temperature coefficient of resistance, film temperature under various conditions, effect of line width and sheet resistivity on maximum power dissipation, statistical distribution and spread for some of these parameters, as a criterion for the degree of their reproducibility and controllability. (Author)

Document Details

Document Type
Technical Report
Publication Date
Jul 01, 1964
Accession Number
AD0608910

Entities

People

  • I. H. Pratt
  • J. J. Mccarthy

Organizations

  • United States Army Communications-Electronics Command

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Coefficients
  • Electrical Resistance
  • Film Resistors
  • Films
  • Heat Treatment
  • Materials
  • Resistance
  • Resistors
  • Statistical Distributions
  • Substrates
  • Temperature Coefficients
  • Thin Film Resistors
  • Thin Films

Readers

  • Electrical Engineering
  • Metallurgy
  • Nanofabrication and Microfabrication.