THE CELLULAR STRUCTURE OF THICK-LAYERED ANODIC OXIDE FILMS
Abstract
The purpose of the report was in the determination of the quantitative interconnection between the thickness of the barrier layer of oxide film and the dimensions of the oxide cells. For objects of research there were chosen specimens of aluminum of AVOOO (99.99% A1) which were then anodically oxidized (anodized) in 4-n H2SO4 with current densities of 2.5, 5, and 10 amp/dm squared and the shaping voltages corresponding to them (E) 22, 25, and 27 v. The temperature of the electrolyte during the anodizing was maintained at about -- 2. The dimensions of the oxide cells are determined from photographs obtained with the electron microscope EM-3 with the aid of collodion and carbon replicas. The thickness of the barrier layer of the anodic film was determined by the electrochemical method, based on the measurement of the dependence, voltage-amperage in alkalized 3- percent solution of tartaric acid (pH = 5.5) in which the rate of the growth of the barrier is equal to 14 A/v. In accordance with these data the thickness of the barrier layer is equal to the fourteenfold maximum terminal voltage of the circuit in volts at which the current does not rise sharply. The latter is observed at the rise above the voltage at which there was formed the given barrier layer.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 09, 1965
- Accession Number
- AD0610343
Entities
People
- F. P. Zalivalov
- N. D. Tomashov
Organizations
- National Air and Space Intelligence Center