INVESTIGATION OF DIFFUSION OF SILICON AND TITANIUM IN NIOBIUM,
Abstract
A study was made of the structure and phase makeup of thermo-diffusion saturation of niobium by silicon and titanium. It was shown that in the process of diffusion of silicon and titanium on the surface of the niobium there is formed a phase of NbSi2 with the titanium dissolved in it (up to 5% by weight) and having a hexagonal lattice with the parameters: a = 4.779 kX; c = 6.493 kX. An investigation was made of the kinetics of the oxidation of niobium saturated by silicon and titanium. The structure and phase makeup of the oxidized film was determined. It was shown than the surface of niobium saturated by silicon and titanium at a temperature of 1,200 oxidizes to lesser extent by a factor of almost one and a half than the surface of niobium saturated by silicon alone. In this situation a thin scale is formed which is tough and well connected with the surface of the niobium.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 22, 1965
- Accession Number
- AD0610798
Entities
People
- D. V. Prokoshkin
- P. M. Arzhanyi
- R. M. Volkova
Organizations
- National Air and Space Intelligence Center