INVESTIGATION OF THE ELECTRICAL AND OPTICAL PROPERTIES OF JUNCTIONS IN VAPOR-DEPOSITED COMPOUND SEMICONDUCTORS.

Abstract

Germanium was epitaxially deposited on gallium arsenide by means of the hydrogen reduction of GeC14. Above 800C, germanium reacted with the GaAs seed to form a black powder. Proper deposition was observed below about 750C. Nonetheless, cross doping of the Ge layer by gallium was observed even at deposition temperatures as low as 670C; the heterojunctions showed tunnel diode characteristics. Deliberately doped junctions of p-Ge on n-GaAs showed the I-V characteristics of Ge junctions, while the photovoltaic response was that of a GaAs junction. Epitaxial lasers were made by the deposition of zinc-doped epitaxial layers on n-type GaAs substrates. It was necessary to codeposit tin along with the zinc. The threshold current density was about 13,000 amps/ sq. cm. (Author)

Document Details

Document Type
Technical Report
Publication Date
Dec 01, 1964
Accession Number
AD0611431

Entities

People

  • Henry T. Minden

Organizations

  • Sperry Corporation

Tags

DTIC Thesaurus Topics

  • Compound Semiconductors
  • Current Density
  • Gallium
  • Gallium Arsenides
  • Germanium
  • Gunpowder
  • Optical Properties
  • Semiconductor Devices
  • Semiconductors
  • Silicon Carbide
  • Tunnel Diodes

Fields of Study

  • Materials science

Readers

  • Semiconductor Device Technology
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene