RESEARCH AND DEVELOPMENT TO OBTAIN SEMICONDUCTOR DIODES FOR ELECTRONIC TUNING.
Abstract
The fabrication of 200-volt planar silicon diodes with an area of 0.1 to 0.4 sq cm was shown to be feasible, and techniques developed for obtaining that objective are described. It was concluded that additional improvements in yields and in electrical characteristics of devices could be realized by implementation of additional processing changes.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 26, 1964
- Accession Number
- AD0615541