INVESTIGATION F ULTR HIGH VACUUM SPUTTERED THIN FILMS,
Abstract
Minor modifications in the construction of the vacuum chamber and changes in the outgassing schedule were made in order to reduce background pressure during sputtering. Single crystal sapphire and calcium fluoride were added to the substrate materials under investigation. Thick films with improved structural and electrical characteristics were grown. A paper was completed on the electrical characteristics of vacuum deposited germanium films. The paper which is included in the report attempts to account quantitatively for the electrical behavior of the films. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 30, 1965
- Accession Number
- AD0615971
Entities
People
- Ernest Pittelli
- George Wallis