GROWTH AND CHARACTERIZATION OF BETASILICON CARBIDE SINGLE CRYSTALS.

Abstract

The process for growing beta-silicon carbide single crystals from solution in carbon-saturated silicon melts was examined to determine how larger crystals may be obtained. It appears that crystals grown to date have been limited in size by the small volume of the supersaturated zone provided for crystallization and by the presence of unstable boundary layers at the crystal growth interface. Means for removing these limitations are suggested. Further work on preparation of ohmic contacts on grown crystals, and on Hall measurements, has served to clarify many experimental limitations in working with very small crystals. Electron mobilities in the range of 500 to 900 sq cm/vsec were obtained on relatively large crystals having resistivities of about 0.1 ohm-cm. Smaller crystals having resistivities of approximately 1 ohm-cm had mobilities in the range of 1000 to 3000 sq cm/vsec. However, since on these crystals the size of contact spots is large compared with intercontact spacings and the correction factors thus affect the resultant value strongly, it is not at present possible to give precise values of mobility and resistivity. (Author)

Document Details

Document Type
Technical Report
Publication Date
May 01, 1965
Accession Number
AD0616637

Entities

People

  • Arne Rosengreen
  • Frank A. Halden
  • Walter E. Nelson

Organizations

  • SRI International

Tags

Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Boundaries
  • Boundary Layer
  • Carbides
  • Compound Semiconductors
  • Crystal Growth
  • Crystallization
  • Crystals
  • Electron Mobility
  • Electrons
  • Metal-Semiconductor Junctions
  • Mobility
  • Silicon
  • Silicon Carbide
  • Single Crystals

Readers

  • Materials Science and Engineering.
  • Semiconductor Device Technology
  • Systems Analysis and Design

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Space