MATRIX CONTROLLED DISPLAY DEVICE, PHASE II.
Abstract
The progress in a program to develop a feasibility model of a bright, large screen matrix type display using in-air thermoplastic recording and TIRP (Total Internal Reflection Prism) projection techniques is reported. Changes made in the Phase I equipment to incorporate the TIRP prism and matrix substrates being used in Phase II are described. Fabrication of the 25 line matrix was completed on 47 glass substrates and is discussed in detail. Fabrication was by etching a transparent, conductive film of indium oxide on which a photo resist image of the matrix pattern had been formed. The matrix consists of 25 electrodes, each 0.8 mils wide, at a density of 500 per inch. Low resistance contacts to the electrodes were formed by evaporation mask techniques. The majority of substrates had no shorts and from zero to nine opens, the result of being over-etched. Considerations leading to the selection of a photographic mask and the glass substrates for the full scale 2000 line matrix are given. The mask contains a minimum 4 x 5 inch pattern of lines at 500 pairs per inch. The substrates are 4 x 5 x 0.250 inch Kodak micro flat glass whose front surface flatness is one wavelength per linear inch or better. (Author)
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 26, 1965
- Accession Number
- AD0618099
Entities
Organizations
- General Electric