NON-DESTRUCTIVE RELIABILITY SCREENING OF ELECTRONIC PARTS, USING RF NOISE MEASUREMENTS
Abstract
The report describes an investigation and evaluation of radio frequency (RF) noise in IN645 silicon diodes and solid tantalum capacitors. The specific intent of this effort was to establish and validate RF noise measurements as a technique for selecting and rejecting from a production lot of electronic parts those parts with lifetimes less than the average lifetime of the production lot, thereby increasing average lifetime and time to first failure. Large quantities of diodes and capacitors were screened; results are categorized and tabulated in this report. In addition to the screening effort, rejected components were life-tested with a control sample of good components, and efforts were made to optimize the screening technique. Also failure mechanisms that cause generation of RF noise were investigated both theoretically and experimentally. Findings of these investigations, as well as results of life test and screening optimization, are also presented in this final report.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 1965
- Accession Number
- AD0618469
Entities
People
- C. Maronde
- H. Avil
- L. Kirvida
Organizations
- Honeywell International, Inc.